PDF's Process-Design Integration solutions optimize fab efficiencies and product profits, through rapid resolution of customers deep sub-micron yield challenges. Proprietary solutions combine process-simulation software, yield and performance modeling software, comprehensive test chips, and integration engineering services. With our silicon-proven technologies, we tailor solutions to one or both of our clients' business needs:
Integrated Yield Ramp solutions
Our Integrated Yield Ramp solutions deliver yield and performance improvements at any stage of a process life cycle, from process development to maturity. Working with PDF clients can:
- Improve initial yields when a product enters production,
- Increase the rate of yield improvement,
- Insert subsequent products into manufacturing quickly and easily.
The result is cost-effective, high-volume production in less time. While client process-centric requirements vary, PDF tailors custom solutions to reduce parametric and systematic yield loss. We quantify the root causes of defects, and thus optimize transistor performance, eliminate sources of systematic defects, center the process window for the intended product requirements, and reduce process variability.
Design-Based Yield Improvement™ solutions
Our Design-Based Yield Improvement (DBYI™) solutions enable clients to modify the design and/or layout of the chip to maximize product yield and manufacturability. DBYI solutions leverage PDF technologies to identify yield-loss contributions from various design features. Applied at the chip or the block level, DBYI maximizes the compatibility of a design with the process. DBYI solutions can be leveraged early in the product life cycle or utilized for a chip already in production. DBYI is often used when the process technology cannot be changed or optimized for the requirements of a single product, and is therefore particularly suited for the fabless arena. Integrated device manufacturing clients often employ both DBYI and process-centric Yield Ramp solutions to achieve the maximum yield and performance improvements.
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