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Characterization Vehicle Infrastructure
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Yield Improvement Using a Fast Product Wafer Level Monitoring System
C. Hess
17th Annual SEMI/IEEE Advanced Semiconductor Manufacturing Conference, 2006
|
High Density Test Structure Array for Accurate Detection and Localization of Soft Fails
C. Hess, M. Squicciarini, S. Yu, J. Burrows, J. Cheng, R. Lindley, A. Swimmer, S. Winters
IEEE 2008 Int. Conference on Microelectronic Test Structures
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Product Engineering
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Dealing with Product Industrialization Risk in Advanced Technologies: Shared Success on the Design–Manufacturing Interface
P. Simon, D. de Vries
White paper
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Performance Modeling
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Yield Learning Through Design Attribute Extraction
PDF Solutions, Inc.
White paper
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Advanced Yield Learning Through Predictive Micro-Yield Modeling
D. J. Ciplickas, A. J. Strojwas, X. Li, R. Vallishayee, W. Maly
Proc. 7th IEEE International Symposium on Semiconductor Manufacturing (ISSM)
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Predictive Yield Modeling for Reconfigurable Memory Circuits
D. J. Ciplickas, X. Li, R. Vallishayee, A. J. Strojwas, R. Williams, M. Renfro, R. Nurani, X. Li, D. J. Ciplickas
Proc. 9th IEEE/SEMI 1998 Advanced Semiconductor Manufacturing Conference, (ISSM)
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Chip Scale 3-D Topography Synthesis
M. Niewczas, X. Li, A. J. Strojwas, W. Maly
23rd Symposium on Optical Microlithography, SPIE Vol.3334
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A Pattern Matching Algorithm for Verification and Analysis of Very Large IC layouts
M. Niewczas, W. Maly, A. J. Strojwas
Proceedings of International Symposium on Physical Design
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Advanced Yield Learning Through Predictive Micro-Yield Modeling
D. J. Ciplickas, A. J. Strojwas, X. Li, R. Vallishayee, W. Maly
Proc. 7th IEEE International Symposium on Semiconductor Manufacturing (ISSM)
|
Design For Manufacturability (DFM)
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What Has Yield Got to Do with IC Design?
R. Radojcic
EE Times
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IC Business Issues and Trends
|
Holistic Yield Improvement: A Comprehensive Methodology for Accelerated Yield and Performance Ramping
M. F. Antonelli, X. Li, K. W. Michaels, A. J. Strojwas
PDF Solutions, Inc.
|
Conquering Process Variability: A Key Enabler for Profitable Manufacturing in Advanced Technology Nodes
A. J. Strojwas
2006 International Symposium on Semiconductor Manufacturing (ISSM)
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Statistical Design for Yield
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Analysis of the Impact of Process Variations on Clock Skew
C. Guardiani, S. Saxena, A. Nardi, A. Neviani, M. Quarantelli, S. Zanella
TSM 2000
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A New Methodology for Concurrent Technology Development and Cell Library Optimization
A. J. Strojwas, T. F. Cobourn, M. Chew
PDF Solutions, Inc.
|
An Asymptotically Constant, Linearly-Bounded Methodology for the Statistical Simulation of Analog Circuits Including Component Mismatch Effects
D. Coder, C. Guardiani, S. Saxena, P. McNamara, P. Schumaker
DAC 2000
|
Circuit-Device Co-Design for High Performance Mixed-Signal Technologies
V. Axelrad, A. Shibkov, C. Guardiani, S. Saxena, P. McNamara
|
TCAD (Technology Computer-Aided Design)
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Statistical SPICE Model Characterization
PDF Solutions, Inc.
White paper
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Robust Mesh Generation for Fast, Accurate, and Stable TCAD
PDF Solutions, Inc.
|
Analysis of Mixed-Signal Manufacturability with Statistical TCAD
J. K. Kibarian, J. McGinty, K. W. Michaels, R. Goossens, M. Redford, D. H. Hanson
1995 International Symposium on Semiconductor Manufacturing
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Shotmap Optimization
|
WAMA™ - a method of optimizing reticle/die placement to increase litho cell productivity
A. Dor, Y. Schwarz
SPIE 2005: Design and Process Integration for Microelectronic Manufacturing
|
Lithography
|
Method for fast and accurate calibration of litho simulator for hot spot analysis
S. Jank, V. Temchenko, M. Poyastro, Y. Nehmadi, P. Karakatsanis, R. Veerasingam, R. Vallishayee, C. Dolainsky, X. Yang, B. Choi
2006 International Symposium on Semiconductor Manufacturing (ISSM)
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Volume Manufacturing Solutions
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Enabling PCM Prediction and Control using FDC Data
H. Matsuhashi, J. Bai, W. Xie, P. Fernandez, L. Ngo, G. Huron, M. Herndon, J. Besnard, M. Williamson, S. Graves, N. Akiya, M. Yu, J. Jensen
APC-AEC Symposium XX
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BEOL parametric variation control with FDC data
H. Matsuhashi, J. Bai, W. Xie, P. Fernandez, L. Ngo, G. Huron, M. Herndon, J. Besnard, M. Williamson, S. Graves, N. Akiya, M. Yu, J. Jensen
2008 International Symposium on Semiconductor Manufacturing
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