Keynotes & Papers

Published Paper

2025 – End-to-End Yield Management for Compound Semiconductors Manufacturing

Compound Semiconductors

Silicon Carbide

Manufacturing Analytics

Yield Management

Published Paper

2025-Full Wafer Inspection for Voltage Contrast Systematic Defects Using High-Throughput Point Scan

e-Beam

Voltage Contrast

Published Paper

2025-Stress-related Local Layout Effects in FinFET Technology and Device Design Sensitivity

Silicon Carbide

Modeling

Published Paper

2025-Product Design Enhancement with Test Structures for Non-Contact Detection of Yield Detractors

Yield Management

e-Beam

Design for Manufacturing

Characterization

Published Paper

2025-The Overview of Silicon Carbide Technology: Status, Challenges, Key Drivers, and Product Roadmap

Silicon Carbide

Electric vehicles

Published Paper

2025-Full-chip Voltage Contrast Inference Using Deep Learning; You Only Look Once: Voltage Contrast (YOLO-VC)

Voltage Contrast

e-Beam

Published Paper

2024 – Expediting manufacturing safe launch with Big Data AI/ML analytic solutions on the cloud

Yield Management

Manufacturing

Published Paper

EDTM 2022 – Novel E-beam Techniques for Inspection and Monitoring

Yield Management

e-Beam

Published Paper

EDTM 2022 – New Method for BEOL Overlay and Process Margin Characterization

Design for Manufacturing

Voltage Contrast

Published Paper

NANOTS 2021 – Advanced High Throughput e-Beam Inspection with DirectScan

Design for Manufacturing

Voltage Contrast

Process Control

Published Paper

APCSM 2020 – Combining Machine Learning with Advanced Outlier Detection to Improve Quality and Lower Cost

AI/ML

Data

Published Paper

IEEE S3S 2019 – Characterization Challenges and Solutions for FDSOI Technologies

Yield Management