SEMI GEM 300 Standards

Introduction to the SEMI E30

The GEM 300 standards are a suite of SEMI specifications built upon the GEM (Generic Equipment Model) framework to enable full automation in semiconductor manufacturing. These standards collectively define key operational scenarios, including carrier arrival and removal, job management for material identification and recipe execution, and substrate tracking. For equipment with reticles, the standards manage reticle pod arrival and removal all activities related to reticles.  

All 300 mm semiconductor fabrication facilities mandate that tools comply with GEM 300 standards to ensure seamless integration and automation. Beyond front-end semiconductor manufacturing, GEM 300 is increasingly being adopted by back-end semiconductor processes and other high-tech industries seeking to enhance factory automation and operational efficiency. 

Purpose of the GEM 300 Standards 

The GEM 300 standards build upon the foundational GEM interface by introducing additional layers of standardization. While each standard operates independently, together they streamline equipment integration within semiconductor factories and enhance overall production efficiency. Importantly, the GEM 300 standards are not exclusive to 300 mm wafer processing—they are also adopted in 200 mm fabs and other industries with similar operational needs. 

A reference document titled 300 mm Operational Flowcharts and Scenarios, originally published by the now-defunct ISMI (International SEMATECH Manufacturing Initiative), outlines practical implementation scenarios involving factory software, equipment, and operators. 

Core Functions of the GEM 300 Standards 

• Carrier management ensures the correct material arrives at the equipment for processing. 
• Jobs specify recipes, material lists, and post-processing instructions. 
• Substrate tracking monitors the movement history of each substrate within the equipment. 
• For equipment with reticles, manage that the correct reticle pod arrives at the equipment and that the reticle is qualified for usage.    

Key Concepts and Features of GEM 300 

As defined in the SEMI E192 standard, the GEM 300 suite includes the following SEMI standards: 

• SEMI E37 (HSMS): A high-speed protocol layer based on TCP/IP, optimized for rapid binary message transmission with minimal overhead.
• SEMI E5 (SECS-II): The message layer and standardized message library used across GEM 300 standards.
• SEMI E30 (GEM): The foundational standard that defines the implementation of GEM interface features. GEM 300 standards extend this by requiring additional events, alarms, variables, and constants to ensure consistent functionality across equipment.
• SEMI E39: Introduces a standardized object model with attributes and messages for creation, querying, and editing.
• SEMI E40: Defines objects and data related to process jobs, including material lists and recipes.
• SEMI E87: Covers carriers and load ports, including their attributes, state models, and associated data. Handles equipment with external load ports and also equipment that store carriers and use both internal and external load ports.
• SEMI E90: Focuses on substrates and substrate locations, including batch handling features.
• SEMI E94: Defines control jobs that group process jobs and specify post-processing substrate destinations.
• SEMI E109: This standard is only implemented by equipment with reticles. Covers reticle pods, reticles, and reticle locations, including their attributes, state models, and associated data.  

Why are the GEM 300 Standards Important to the Industry? 

The GEM 300 standards are critical to the semiconductor industry due to their widespread adoption and role in enabling automation: 

• For Equipment Suppliers: Once implemented, GEM 300-compliant equipment can be deployed in any 300 mm front-end facility with minimal to no customization.
• For Chipmakers and Factories: Many fabs mandate GEM 300 compliance and supplement it with operational directives tailored to their specific workflows. GEM 300 compliant equipment are much easier to integrate.
• For Software Providers: The standards facilitate the development of interoperable software solutions and equipment control frameworks, accelerating time-to-market for new tools.
• For the Industry at Large: With universal adoption across front-end semiconductor production tools, GEM 300 has proven its reliability and effectiveness. It supports Smart Factory initiatives, reduces operational costs, improves yield, and enhances scalability. 

FAQ 

Do I have to implement all of GEM 300 standards? 

No. Some of the standards might not apply. For example, a equipment that purges carriers and never removes substrates from the carrier would not need substrate tracking. Most tools implement all the GEM 300 standards together. 

Are the GEM 300 standards modified frequently? 

Yes, but not extensively. Few changes introduce backward compatibility issues. Recent changes include adding mapping names to the standards. And E87 recently added a new carrier complete prediction state model.  

Can I use the GEM 300 standards in a 200mm factory? 

Yes. There is nothing in the GEM 300 standards that specific a specific substrate size.  

Can I use the GEM 300 standards on an equipment that does not process wafers? 

Yes. The standards intentionally use the term ‘substrate’ instead of ‘wafer’ and ‘carrier’ instead of ‘FOUP’. They can be applied to any similar process where the processed material arrives in a carrier.   

Can I use the GEM 300 standards in a semiconductor back-end factory? 

Yes. Recent changes to the GEM 300 standards have made them more flexible specifically to allow semiconductor back-end adoption. For example, the standards now support equipment that don’t have a carrier ID reader.  

What PDF Solutions Products Support SEMI E30?

PDF Solutions offers several products specifically designed to implement and maximize the benefits of SEMI E30: 

Equipment-Side 

• Cimetrix CIMConnect: Provides an SECS/GEM interface for equipment suppliers, enabling seamless communication with factory hosts. 
• Cimetrix CIM300: Supports GEM300 standards compliance for 300mm fabs, combining GEM, E87, E90, and other standards. 
• Cimetrix CIMControlFramework: A complete software framework for equipment automation systems, designed to integrate seamlessly with SEMI standards.
• Cimetrix EquipmentConnect: A powerful software toolkit engineered for seamless implementation of SEMI GEM, GEM300, and EDA/Interface A standards

Factory-Side 

• Sapience Data Platform: A host-side solution supporting SEMI standards, enabling efficient factory host operations.
• Cimetrix HostConnect: An enhanced software library for creating host applications using SECS-II messaging over HSMS.
• Cimetrix SECSConnect: A library for creating applications using SECS-II messaging over SECS-I or HSMS.

Test 

• Cimetrix EquipmentTest: A comprehensive SECS/GEM testing solution engineered to validate equipment interface compliance with SEMI standards and streamline integration with factory host systems.

These solutions facilitate reliable communication, monitoring, and control, making it easier for manufacturers to adopt and implement SEMI E30 in their operations.